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Choosing Intellectual Protection: Imitation, Patent Strength and Licensing

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Author Info
David Encaoua ()
Yassine Lefouili ()

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Abstract

This paper investigates the choice of an intellectual protection regime for a process innovation. We set up a multi-stage model in which choosing between patent and trade secrecy is affected by three parameters: the patent strength defined as the probability that the right is upheld by the court, the cost of imitating a patented innovation relative to the cost of imitating a secret innovation, and the innovation size defined as the extent of the cost reduction. The choice of the protection regime is the result of two effects: the damage effect evaluated under the unjust enrichment doctrine and the effect of market competition that occurs under the shadow of infringement. We find that large innovations are likely to be kept secret whereas small innovations are always patented. Furthermore, medium innovations are patented only when patent strength is sufficiently high. Finally, we investigate a class of licensing agreements used to settle patent disputes between patent holders and their competitors.

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File URL: http://www.cesifo-group.de/DocCIDL/cesifo1_wp1715.pdf
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Publisher Info
Paper provided by CESifo Group Munich in its series CESifo Working Paper Series with number CESifo Working Paper No. 1715.

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Date of creation: 2006
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Handle: RePEc:ces:ceswps:_1715

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Related research
Keywords: patent; trade secrecy; imitation; licensing;

Other versions of this item:

Find related papers by JEL classification:
D45 - Microeconomics - - Market Structure and Pricing - - - Rationing; Licensing
L10 - Industrial Organization - - Market Structure, Firm Strategy, and Market Performance - - - General
O32 - Economic Development, Technological Change, and Growth - - Technological Change - - - Management of Technological Innovation and R&D
O34 - Economic Development, Technological Change, and Growth - - Technological Change - - - Intellectual Property Rights

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This page was last updated on 2009-12-1.


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