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A study on properties of yttrium-stabilized zirconia thin films fabricated by different deposition techniques

Author

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  • Paek, Jun Yeol
  • Chang, Ikwhang
  • Park, Joon Ho
  • Ji, Sanghoon
  • Cha, Suk Won

Abstract

This paper investigates the micro-structural, chemical and crystalline properties of yttrium-stabilized zirconia (YSZ) thin films by using pulsed laser deposition (PLD), atomic layer deposition (ALD) and sputter. Atomic ratio of Y:Zr of YSZ thin films fabricated by three different deposition methods was adjustable. ALD YSZ with smaller grains has high density compared to PLD YSZ and sputter YSZ. On the other hand, the low crystallinity of ALD YSZ can be supplemented by annealing process. From these experimental results, ALD YSZ thin film has the characteristics that satisfy requirements for using an electrolyte of thin film solid oxide fuel cells.

Suggested Citation

  • Paek, Jun Yeol & Chang, Ikwhang & Park, Joon Ho & Ji, Sanghoon & Cha, Suk Won, 2014. "A study on properties of yttrium-stabilized zirconia thin films fabricated by different deposition techniques," Renewable Energy, Elsevier, vol. 65(C), pages 202-206.
    • Handle: RePEc:eee:renene:v:65:y:2014:i:c:p:202-206
    DOI: 10.1016/j.renene.2013.08.043
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    Cited by:

    1. Cho, Gu Young & Lee, Yoon Ho & Yu, Wonjong & An, Jihwan & Cha, Suk Won, 2019. "Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells," Energy, Elsevier, vol. 173(C), pages 436-442.
    2. Serikzhan Opakhai & Kairat Kuterbekov, 2023. "Metal-Supported Solid Oxide Fuel Cells: A Review of Recent Developments and Problems," Energies, MDPI, vol. 16(12), pages 1-24, June.
    3. Park, Joonho & Lee, Yeageun & Chang, Ikwhang & Cho, Gu Young & Ji, Sanghoon & Lee, Wonyoung & Cha, Suk Won, 2016. "Atomic layer deposition of yttria-stabilized zirconia thin films for enhanced reactivity and stability of solid oxide fuel cells," Energy, Elsevier, vol. 116(P1), pages 170-176.

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