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Recent Progress and Future Challenges of Functional Textiles Fabricated by Atomic Layer Deposition

Author

Listed:
  • Fengxiang Chen

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Xin Liu

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Ke Li

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Lang Jiang

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Huiyu Yang

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Binhai Dong

    (Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials and Ministry of Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, China)

  • Shimin Wang

    (Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials and Ministry of Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, China)

  • Bo Deng

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

  • Weilin Xu

    (State Key Laboratory of New Textile Materials & Advanced Processing Technologies and Hubei Key Laboratory of Advanced Textile Materials & Application and School of Material Science and Engineering, Wuhan Textile University, China)

Abstract

Atomic Layer Deposition (ALD) technique has been regarded as one of the most efficient and promising approaches for the functionalization of complex-shaped surfaces due to its precise and simple thickness control, excellent conformality. Additionally, mild growth conditions such as low temperature and oxygen-free characteristic of ALD made it particularly attracting for the fabrication of functional textiles. Functionalization of natural or synthetic fabrics such as cotton, silk, polyvinyl alcohol, Kevlar and even to chemical-inert Carbon Fiber (CFF) via ALD to endow them with super hydrophobicity, conductivity, antibacterial activity, UV-blocking property, anti-yellowing property, and retardancy are reviewed. Finally, the challenges and perspectives on the application of ALD in the functionalization of fabrics are proposed.

Suggested Citation

  • Fengxiang Chen & Xin Liu & Ke Li & Lang Jiang & Huiyu Yang & Binhai Dong & Shimin Wang & Bo Deng & Weilin Xu, 2017. "Recent Progress and Future Challenges of Functional Textiles Fabricated by Atomic Layer Deposition," Current Trends in Fashion Technology & Textile Engineering, Juniper Publishers Inc., vol. 1(3), pages 48-52, November.
  • Handle: RePEc:adp:ctftte:v:1:y:2017:i:3:p:48-52
    DOI: 10.19080/CTFTTE.2017.01.55561
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