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Beyond the Screen: Safeguarding Mental Health in the Digital Workplace Through Organizational Commitment and Ethical Environment

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  • Ali Bai
  • Morteza Vahedian

Abstract

This research explores the intricate relationship between organizational commitment and nomophobia, illuminating the mediating influence of the ethical environment. Utilizing Meyer and Allen's three-component model, the study finds a significant inverse correlation between organizational commitment and nomophobia, highlighting how strong organizational ties can alleviate the anxiety of digital disconnection. The ethical environment further emerges as a significant mediator, indicating its dual role in promoting ethical behavior and mitigating nomophobia's psychological effects. The study's theoretical advancement lies in its empirical evidence on the seldom-explored nexus between organizational commitment and technology-induced stress. By integrating organizational ethics and technological impact, the research offers a novel perspective on managing digital dependence in the workplace. From a practical standpoint, this study serves as a catalyst for organizational leaders to reinforce affective and normative commitment, thereby reducing nomophobia. The findings underscore the necessity of ethical leadership and comprehensive ethical policies as foundations for employee well-being in the digital age. Conclusively, this study delineates the protective role of organizational commitment and the significance of ethical environments, guiding organizations to foster cultures that balance technological efficiency with employee welfare. As a contribution to both academic discourse and practical application, it emphasizes the importance of nurturing a supportive and ethically sound workplace in an era of pervasive digital integration.

Suggested Citation

  • Ali Bai & Morteza Vahedian, 2023. "Beyond the Screen: Safeguarding Mental Health in the Digital Workplace Through Organizational Commitment and Ethical Environment," Papers 2311.02422, arXiv.org.
    • Handle: RePEc:arx:papers:2311.02422
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