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Fractal property of Eden growth morphology with acceleration effect

Author

Listed:
  • Yoshinaga, H
  • Nagamine, T
  • Takano, H
  • Miyazima, S

Abstract

Fundamental growth process of Eden model has been used in many simulational studies of growing surfaces and the roughness exponent αE=12 and growth exponent βE=13[2] are well known. In this study we have added acceleration effect to the Eden model and examined universality class. We have simulated the growing Eden surface for several concentrations of acceleration sites p so as to observe changing morphology with p. As the simulation is limited to a finite lattice, we have to estimate exponents for infinite lattice size by simulating several lattice sizes Lx×Ly. At the conclusion we have estimated roughness and growth exponents for infinite lattice size and obtained αA∞≃αE=12 and βA∞≃βE=13 which are similar to those of normal Eden model for all concentrations of acceleration sites.

Suggested Citation

  • Yoshinaga, H & Nagamine, T & Takano, H & Miyazima, S, 1999. "Fractal property of Eden growth morphology with acceleration effect," Physica A: Statistical Mechanics and its Applications, Elsevier, vol. 266(1), pages 362-365.
  • Handle: RePEc:eee:phsmap:v:266:y:1999:i:1:p:362-365
    DOI: 10.1016/S0378-4371(98)00617-7
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