Taguchi-Based Parametric Study of Silicon Nitride Microring Resonators for Optical WDM Filtering

The rapid advancement of optical communication technology has underscored the need for high-performance components, particularly in Wavelength Division Multiplexing (WDM) systems. This paper presents the design and optimization of a Silicon Nitride (SiNx) Microring Resonator (MRR) filter, a critical component for WDM applications. Traditional graphene-based filters have been limited by low free spectral range (FSR) and high propagation losses. In contrast, the SiNx-based MRR offers superior performance, attributed to its low loss, high optical power tolerance, and broad spectral operation band. The study employs Coupled Mode Theory (CMT) and the Transfer Matrix Method (TMM) to model the MRR, providing an in-depth analysis of its optical characteristics. Furthermore, the Taguchi method is utilized for the optimization of key geometrical parameters, focusing on maximizing the FSR and Q-factor. The optimized design achieves a remarkable FSR of 19.69 nm and a Q-factor of 22.22×10⠹, marking significant improvements over conventional designs. These results indicate the potential of the optimized SiNx MRR for deployment in high-speed, large-bandwidth optical communication networks.