IDEAS home Printed from
MyIDEAS: Log in (now much improved!) to save this paper


Listed author(s):
  • 東川, 巌
Registered author(s):

    Nikon、Canon 二社で80%に達する199 年代初頭の絶頂期から、国内半導体デバイスメーカの凋落と時を一に国内半導体露光装置メーカNikon、Canon の地盤沈下が続いている。2002 年には着実にシェアを伸ばしてきたASML 社がトップに躍り出た。露光装置はコンタクト露光に始まり、プロキシティ露光、1:1 ミラースキャンから縮小投影露光へ進み、縮小投影露光はg 線、i 線、KrF、ArF と短波長化し、Step&Repeat からStep&Scanに移行してきた。競争は過酷で次世代露光装置の開発に露光装置メーカの命運がかかっている。2000 年前後にはArF 193 nm の次の技術が混沌としていた。ArF 193 nm に目途がついた1950 年代後半、次世代リソグラフィの選択は、露光装置メーカだけでなく半導体業界全体の問題でもあった。波長メリットが少ないとされたF2 157 nm は当初選択されずEPL に代表される電子線投影露光やEUVL と呼ばれる軟X線縮小投影露光が候補になっていた。 しかし開発は進展せずF2 157 nm に軸を置かざるを得なくなった。本稿では露光装置メーカ、デバイスメーカ、コンソーシアムなどが、EPL、EUVL に代えて再浮上させたF2 157 nmリソグラフィ技術の選択、開発の遅延、ArF 193 nm 液浸リソグラフィ技術への急展開と集中、F2 157 nm リソグラフィの断念、ArF 193 nm 液浸リソグラフィの急成長、限界となるNA 1.35 装置の投入へと突き進んだ過程を追い、技術開発の方向を変えていく様、リソグラフィ技術の世代交代の過酷さ、更なる寡占化を生んだ選択と集中・成長サイクルの創出過 程に垣間見られるオープンイノベーション戦略の優劣に迫る。

    If you experience problems downloading a file, check if you have the proper application to view it first. In case of further problems read the IDEAS help page. Note that these files are not on the IDEAS site. Please be patient as the files may be large.

    File URL:
    Download Restriction: no

    Paper provided by Institute of Innovation Research, Hitotsubashi University in its series IIR Working Paper with number 13-10.

    in new window

    Length: 44 p.
    Date of creation: Mar 2013
    Handle: RePEc:hit:iirwps:13-10
    Contact details of provider: Postal:
    2-1 Naka, Kunitachi City, Tokyo 186-8601

    Web page:

    More information through EDIRC

    No references listed on IDEAS
    You can help add them by filling out this form.

    This item is not listed on Wikipedia, on a reading list or among the top items on IDEAS.

    When requesting a correction, please mention this item's handle: RePEc:hit:iirwps:13-10. See general information about how to correct material in RePEc.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: (Digital Resources Section, Hitotsubashi University Library)

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    If references are entirely missing, you can add them using this form.

    If the full references list an item that is present in RePEc, but the system did not link to it, you can help with this form.

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your profile, as there may be some citations waiting for confirmation.

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    This information is provided to you by IDEAS at the Research Division of the Federal Reserve Bank of St. Louis using RePEc data.