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Introduction and General Theory of Finite Element Method

In: Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections

Author

Listed:
  • Cher Ming Tan

    (Nanyang Technological University)

  • Zhenghao Gan

    (Semiconductor Manufacturing International (Shanghai) Corp.)

  • Wei Li

    (Singapore Institute of Manufacturing Technology)

  • Yuejin Hou

    (Nanyang Technological University)

Abstract

The complexity of the physics of electromigration and the stress-induced voiding can be seen in Chap. 2 . In order to model the physics realistically in today’s interconnects so as to obtain better understanding of the physics and to identify key parameters, FEM is needed as pointed out in Chap. 2 . To begin the discussion on FEM applications in electromigration and stress-induced voiding, let us have a basic understanding on the FEM. For readers familiar with FEM, this chapter may be skipped.

Suggested Citation

  • Cher Ming Tan & Zhenghao Gan & Wei Li & Yuejin Hou, 2011. "Introduction and General Theory of Finite Element Method," Springer Series in Reliability Engineering, in: Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections, edition 1, chapter 0, pages 39-71, Springer.
    • Handle: RePEc:spr:ssrchp:978-0-85729-310-7_3
    DOI: 10.1007/978-0-85729-310-7_3
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