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The Growth of Vapor Deposited Amorphous Zr65Al7.5Cu27.5-Alloy Films: Experiment and Simulation

In: Lectures on Applied Mathematics

Author

Listed:
  • S. G. Mayr

    (Universität Augsburg, Institut für Physik)

  • M. Moske

    (Stiftung caesar)

  • K. Samwer

    (Universität Göttingen, I. Physikalisches Institut)

Abstract

The surface structures of amorphous Zr65Al7.5Cu27.5-alloy films prepared by ultra high vacuum physical vapor deposition are investigated with scanning tunneling microscopy to identify the major surface mechanisms for amorphous film growth. A fourier analysis of the STM images shows that curvature induced surface diffusion and a non-smoothing surface mechanism is present. Numerical simulations using a Monte-Carlo and a continuum model which includes adatom concentration triggered surface diffusion as additional coarsing mechanism are in excellent agreement with the experimental results.

Suggested Citation

  • S. G. Mayr & M. Moske & K. Samwer, 2000. "The Growth of Vapor Deposited Amorphous Zr65Al7.5Cu27.5-Alloy Films: Experiment and Simulation," Springer Books, in: Hans-Joachim Bungartz & Ronald H. W. Hoppe & Christoph Zenger (ed.), Lectures on Applied Mathematics, pages 233-250, Springer.
    • Handle: RePEc:spr:sprchp:978-3-642-59709-1_16
    DOI: 10.1007/978-3-642-59709-1_16
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