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From Molecules to Thin Films: GaP Nucleation on Si Substrates

In: High Performance Computing in Science and Engineering ‘13

Author

Listed:
  • Andreas Stegmüller

    (Philipps-Universität Marburg, Fachbereich Chemie)

  • Ralf Tonner

    (Philipps-Universität Marburg, Fachbereich Chemie)

Abstract

Silicon is prominently used as a substrate for a variety of functionalized materials. Those are tuned towards direct band gap semiconductor materials or for subsequent adsorption and growth of optically active organic compounds.

Suggested Citation

  • Andreas Stegmüller & Ralf Tonner, 2013. "From Molecules to Thin Films: GaP Nucleation on Si Substrates," Springer Books, in: Wolfgang E. Nagel & Dietmar H. Kröner & Michael M. Resch (ed.), High Performance Computing in Science and Engineering ‘13, edition 127, pages 185-199, Springer.
    • Handle: RePEc:spr:sprchp:978-3-319-02165-2_14
    DOI: 10.1007/978-3-319-02165-2_14
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