STRUCTURAL CHARACTERIZATION OF BRASS BY Au-ION IMPLANTATION: SURFACE ANALYSIS

Brass has been tested for the modification in its structural, electrical properties as well as hardness using Au-ion implantation. Four ion doses were devised as follows: 6.74×1013, 1.35×1014, 2.01×1014 and 2.71×1014 ions/cm2. SRIM/TRIM software helped to predict Au-ion distribution inside the brass. The alloy was then characterized using X-ray diffraction (XRD), microhardness, four-point probe testing and scanning electron microscopy (SEM) analysis. The microstructure parameters from XRD analysis were determined and used for the calculation of lattice parameter, crystallite size, microstrain and dislocation density. The microhardness value was observed to be changed from 106HV to 119HV with the maximum increase as 12.26%. A noticeable decrease occurred in the crystallite size from 44nm to 34nm for the plane (2 2 0) due to increase in dislocation density, and the corresponding change in (I/Imax) is also noted. The electrical conductivity is overall found to be decreased, whereas the d-spacing values fluctuated with ion dose. SEM analysis helped observing the microstructural changes, which occurred in the form of particulates and defects, namely pores, voids, cavities and craters. The relationships between microstructure and these properties are important for developing new materials for future prospects.