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Amorphization Of Cerium Mononitride During Oxidization Characterized By Optical Microscopy, Scanning Electron Microscopy, X-Ray Diffraction And X-Ray Photoelectron Spectroscopy

Author

Listed:
  • WEI LIANG

    (The State Key Laboratory for New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China†High-Tech Institute of Beijing, Beijing 100094, P. R. China)

  • QIFA PAN

    (#x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China)

  • YIN HU

    (#x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China)

  • LIZHU LUO

    (#x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China)

  • KEZHAO LIU

    (#xA7;China Academy of Engineering Physics, Mianyang 621907, P. R. China)

  • ZHENGJUN ZHANG

    (#xB6;The Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Collaborative Innovation Center of Advanced Nuclear Energy Technology, Tsinghua University, Beijing 100084, P. R. China)

Abstract

Cerium mononitride (CeN) film was fabricated by dual ion beam sputtering deposition method on silicon wafer. The oxidization process of CeN film was monitored by optical microscopy (OM), scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The results showed that, when the CeN film was exposed to ambient atmosphere, bubbles appeared on the film surface rapidly and then the surface flaked off to powders. Meanwhile, the CeN film changed from polycrystalline to amorphous. XPS analysis indicated that the CeN was oxidized to Ce2O3 initially, and then further oxidized to CeO2. These results indicated that the CeN film degraded easily in ambient atmosphere, exhibiting little or no passivation.

Suggested Citation

  • Wei Liang & Qifa Pan & Yin Hu & Lizhu Luo & Kezhao Liu & Zhengjun Zhang, 2019. "Amorphization Of Cerium Mononitride During Oxidization Characterized By Optical Microscopy, Scanning Electron Microscopy, X-Ray Diffraction And X-Ray Photoelectron Spectroscopy," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 26(04), pages 1-7, May.
    • Handle: RePEc:wsi:srlxxx:v:26:y:2019:i:04:n:s0218625x18501809
    DOI: 10.1142/S0218625X18501809
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