IDEAS home Printed from https://ideas.repec.org/a/wsi/srlxxx/v25y2018i02ns0218625x18500476.html
   My bibliography  Save this article

Formulae For Maximum Escape Depth Of Rediffused Electrons And Backscattering Coefficient Of Metal Films

Author

Listed:
  • A. G. XIE

    (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, P. R. China)

  • H. Y. LIU

    (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, P. R. China)

  • Y. YU

    (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, P. R. China)

  • Y. Q. XIA

    (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, P. R. China)

  • T. Y. WAN

    (School of Physics and Optoelectronic Engineering, Nanjing University of Information Science and Technology, Nanjing 210044, P. R. China)

Abstract

Based on the experimental maximum escape depth S(Wp0, Z) of rediffused electrons from atomic number Z metal at incident energy of primary electron Wp0, the relationship among S(Wp0, Z), Wp0 and Z in the energy range of 9.3keV≦Wp0≦40keV was obtained and proved to be true by experimental data. According to the experimental results of rediffused electrons, the characteristics of secondary electron emission, relationships among parameters of rediffused electrons and the main processes of rediffused electrons emission, the formula for Wp0 backscattering coefficient η(Wp0, Z, t) of Z metal films with film thickness t as a function of t, Z and was deduced, and the results were analyzed. It is concluded that the deduced formula for η(Wp0, Z, t) can be used to calculate η(Wp0, Z, t) in the energy range of 9.3keV≦Wp0≦40keV. The secondary electron yield δ from thin films are applied in more and more fields such as electronic information technology, accelerator and space flight, and η(Wp0, Z, t) is an important parameter of δ from Z metal films. So deducing the formula for η(Wp0, Z, t) in this study is necessary.

Suggested Citation

  • A. G. Xie & H. Y. Liu & Y. Yu & Y. Q. Xia & T. Y. Wan, 2018. "Formulae For Maximum Escape Depth Of Rediffused Electrons And Backscattering Coefficient Of Metal Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 25(02), pages 1-6, February.
    • Handle: RePEc:wsi:srlxxx:v:25:y:2018:i:02:n:s0218625x18500476
    DOI: 10.1142/S0218625X18500476
    as

    Download full text from publisher

    File URL: http://www.worldscientific.com/doi/abs/10.1142/S0218625X18500476
    Download Restriction: Access to full text is restricted to subscribers
    File URL: https://libkey.io/10.1142/S0218625X18500476?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:wsi:srlxxx:v:25:y:2018:i:02:n:s0218625x18500476. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Tai Tone Lim (email available below). General contact details of provider: http://www.worldscinet.com/srl/srl.shtml .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.