Author
Listed:
- HEE HWAN LEE
(Department of Mechanical Engineering, Hanyang University, #1271 Sa 1-Dong, Ansan, Kyunggi-Do, 425-791, South Korea)
- SEOUNG HWAN LEE
(Department of Mechanical Engineering, Hanyang University, #1271 Sa 1-Dong, Ansan, Kyunggi-Do, 425-791, South Korea)
Abstract
The material removal rate (MRR) during precision finishing/polishing is a key factor, which dictates the process performance. Moreover, the MRR or wear rate is closely related to the material/part reliability. For nanoscale patterning and/or planarization on nano-order thickness coatings, the prediction and in-process monitoring of the MRR is necessary, because the process is not characterizable due to size effects and material property/process condition variations as a result of the coating/substrate interactions. The purpose of this research was to develop a practical methodology for the prediction and in-process monitoring of MRR during nanoscale finishing of coated surfaces. Using a specially designed magnetic abrasive finishing (MAF) and acoustic emission (AE) monitoring setup, experiments were carried out on indium-zinc-oxide (IZO) coated Pyrex glasses. After a given polishing time interval, AFM indentation was conducted for each workpiece sample to measure the adhesion force variations of the coating layers (IZO), which are directly related to the MRR changes. The force variation and AE monitoring data were compared to the MRR calculated form the surface measurement (Nanoview) results. The experimental results demonstrate strong correlations between AFM indentation and MRR measurement data. In addition, the monitored AE signals show sensitivity of the material structure variations of the coating layer, as the polishing progresses.
Suggested Citation
Hee Hwan Lee & Seoung Hwan Lee, 2017.
"Analysis Of The Material Removal Rate In Magnetic Abrasive Finishing Of Thin Film Coated Pyrex Glass,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 24(supp01), pages 1-9, November.
Handle:
RePEc:wsi:srlxxx:v:24:y:2017:i:supp01:n:s0218625x1850004x
DOI: 10.1142/S0218625X1850004X
Download full text from publisher
As the access to this document is restricted, you may want to
for a different version of it.
Corrections
All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:wsi:srlxxx:v:24:y:2017:i:supp01:n:s0218625x1850004x. See general information about how to correct material in RePEc.
If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.
We have no bibliographic references for this item. You can help adding them by using this form .
If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.
For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Tai Tone Lim (email available below). General contact details of provider: http://www.worldscinet.com/srl/srl.shtml .
Please note that corrections may take a couple of weeks to filter through
the various RePEc services.