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Carbon Ion Irradiation Effects On Pulsed Laser Deposited Titanium Nitride Thin Films

Author

Listed:
  • KHALIQ MAHMOOD

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

  • SHAZIA BASHIR

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

  • MAHREEN AKRAM

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

  • ASMA HAYAT

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

  • FAIZAN-Ul-HAQ

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

  • SHAHZAD SAADAT

    (Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan)

Abstract

Pulse laser deposited thin films of TiN are irradiated by 1 MeV carbon (C+) ions beam for various doses ranging 0.4 to 2.8 × 1014ions/cm2. Atomic force microscopy (AFM) analysis reveals the formation of hillocks like structures after ion irradiation. X-ray diffraction (XRD) investigations show that the film crystallinity increases for lower doses ranging from 0.4 to 1.2 × 1014ions/cm2and decreases for higher doses (2 to 2.8 × 1014ions/cm2) of ions. No new bands are identified from Raman spectroscopy. However, a noticeable change in microhardness has been observed. The hillock densities as well as hardness are strongly dependent upon ion dose.

Suggested Citation

  • KHALIQ MAHMOOD & SHAZIA BASHIR & MAHREEN AKRAM & ASMA HAYAT & FAIZAN-Ul-HAQ & SHAHZAD SAADAT, 2015. "Carbon Ion Irradiation Effects On Pulsed Laser Deposited Titanium Nitride Thin Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 22(02), pages 1-10.
    • Handle: RePEc:wsi:srlxxx:v:22:y:2015:i:02:n:s0218625x15500201
    DOI: 10.1142/S0218625X15500201
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