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Investigation Of The Gasochromic Behavior For Nickel Oxide Thin Films Using Uv-Vis-Nir Spectroscopy

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  • HUSSEIN SHANAK

    (Experimentalphysik, Universität des Saarlandes, D-66123 Saarbrücken, Germany;
    Physics Department, Palestine Technical University-Kadoorie (PTUK), Tulkarm, Palestine)

Abstract

Thin films of nickel oxide were deposited with different thicknesses in a mixed atmosphere ofO2andArgases from a high purity target of 99.99% nickel using the reactive DC-sputtering technique. The same amount of thePt-catalyst was sputtered from a high purity target of 99.99% platinum inAratmosphere onto the top of nickel oxide films with different thicknesses. The gasochromic behavior of the films was investigated. The optical response was measured for the as-deposited and for the intercalated films with hydrogen ions. The change of the transmission resulting from the ion insertion in the films was calculated in the visible and the near infrared regions. The fundamental optical energy gap was determined and studied as a function of the film thickness and the time of ion intercalation.

Suggested Citation

  • Hussein Shanak, 2014. "Investigation Of The Gasochromic Behavior For Nickel Oxide Thin Films Using Uv-Vis-Nir Spectroscopy," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 21(03), pages 1-6.
    • Handle: RePEc:wsi:srlxxx:v:21:y:2014:i:03:n:s0218625x14500437
    DOI: 10.1142/S0218625X14500437
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