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MECHANICAL AND TRIBOLOGICAL BEHAVIOR OFVNANDHfNFILMS DEPOSITED VIA REACTIVE MAGNETRON SPUTTERING

Author

Listed:
  • C. ESCOBAR

    (Department of Physics, Universidad del Valle, Ciudad Universitaria Meléndez, Calle 13 #100-00 Edificio 320, A.A. 25360 Cali, Colombia)

  • M. VILLARREAL

    (Department of Physics, Universidad del Valle, Ciudad Universitaria Meléndez, Calle 13 #100-00 Edificio 320, A.A. 25360 Cali, Colombia)

  • J. C. CAICEDO

    (Department of Physics, Universidad del Valle, Ciudad Universitaria Meléndez, Calle 13 #100-00 Edificio 320, A.A. 25360 Cali, Colombia;
    Powder Metallurgy and Processing of Solid Recycled Research Group, Universidad del Valle, Cali, Colombia)

  • J. ESTEVE

    (Department of Applied Physics and Optics, Universitat de Barcelona. Martí i Franquès 1, E-08028 Barcelona, Catalunya, Spain)

  • P. PRIETO

    (Department of Physics, Universidad del Valle, Ciudad Universitaria Meléndez, Calle 13 #100-00 Edificio 320, A.A. 25360 Cali, Colombia;
    Excellence Center for Novel Materials, Calle 13 #100-00 Edificio 320, espacio 1026, Cali, Colombia)

Abstract

HfNandVNthin films were deposited onto silicon and 4140 steel substrates with r.f. reactive magnetron sputtering by usingHfandVmetallic targets with 4-inch diameter and 99.9% purity in argon/nitrogen atmosphere, applying a substrate temperature of 250°C and a pressure of 1.2 × 10-3mbar. In order to evaluate the structural, chemical, morphological, mechanical and tribological properties, we used X-ray diffraction (XRD), transmission electron microscopy (TEM), energy dispersive X-ray analysis (EDX), atomic force microscopy (AFM), scanning electron microscopy (SEM), nanoindentation, pin-on-disc and scratch tests. Film structure determined by XRD showed that FCC (NaCl-type) films are formed in both the cases byδ-HfNandδ-VNphases. Hardness and elastic modulus values obtained for both the films were 21 and 224 GPa for the HfN film and 19 and 205 GPa for theVNfilm, respectively. Additionally, the films showed low friction coefficient of 0.44 forHfNand 0.62 forVNwhen these films were evaluated against 100Cr6steel, and finally the critical load was found at 41 N for theHfNfilm and 34 N for theVNfilm.

Suggested Citation

  • C. Escobar & M. Villarreal & J. C. Caicedo & J. Esteve & P. Prieto, 2013. "MECHANICAL AND TRIBOLOGICAL BEHAVIOR OFVNANDHfNFILMS DEPOSITED VIA REACTIVE MAGNETRON SPUTTERING," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 20(03n04), pages 1-12.
    • Handle: RePEc:wsi:srlxxx:v:20:y:2013:i:03n04:n:s0218625x13500406
    DOI: 10.1142/S0218625X13500406
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