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Effects Of Temperature And Sputtering Power On The Morphology And Optical Constants Of Thin Tantalum Films

Author

Listed:
  • SHANG GAO

    (Shandong University, Department of Optical Engineering, Shandong, Jinan 250100, China)

  • SHUYUN WANG

    (Shandong Normal University, Analysis and Testing Center, Shandong, Jinan 250014, China)

  • JIE LIAN

    (Shandong University, Department of Optical Engineering, Shandong, Jinan 250100, China)

  • PING LI

    (Shandong University, Department of Optical Engineering, Shandong, Jinan 250100, China)

  • XIAO WANG

    (Shandong University, Department of Optical Engineering, Shandong, Jinan 250100, China)

Abstract

A set of thin tantalum films was prepared by direct current (DC) magnetron sputtering using different substrate temperatures and sputtering power. In order to identify the optimal condition for hillock free thin tantalum (Ta) film deposition, AFM was employed to measure surface morphology of theTafilms and to research the effect of substrate temperatures and sputtering power on the films surface. The relationship between optical constants and film stress of thinTafilms was also investigated. The comparison of AFM results showed that thinTafilms deposited at 500 K with a sputtering power of 56 W produced a hillock free surface as well as minimum surface roughness. All films were also measured by spectroscopic ellipsometry (SE) to characterize their optical properties. Refractive index and extinction coefficient of thinTafilms obtained from SE results by using a 5-layer model increased simultaneously, when sputtering power increased and the substrate temperature remain unchanged. However when the power was a constant, the thinTafilm sputtered at 500 K had a lower refractive index and extinction coefficient than other samples sputtered with other substrate temperatures from 300 to 700 K.

Suggested Citation

  • Shang Gao & Shuyun Wang & Jie Lian & Ping Li & Xiao Wang, 2012. "Effects Of Temperature And Sputtering Power On The Morphology And Optical Constants Of Thin Tantalum Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 19(04), pages 1-6.
    • Handle: RePEc:wsi:srlxxx:v:19:y:2012:i:04:n:s0218625x12500394
    DOI: 10.1142/S0218625X12500394
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