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EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OFTiANDTiNFILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE

Author

Listed:
  • NISHAT ARSHI

    (School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea)

  • JUNQING LU

    (School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea)

  • BON HEUN KOO

    (School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea)

  • CHAN GYU LEE

    (School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea)

  • FAHEEM AHMED

    (School of Nano and Advanced Materials Engineering, Changwon National University, 9 Sarim dong Changwon-641-773, South Korea)

Abstract

We report the deposition ofTiandTiNfilms onSi/SiO2(100) substrate using e-beam evaporation technique. The influence of substrate temperature on the structural and morphological properties has been studied. The structure and morphology of the deposited films were analyzed by X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM) measurements, respectively. XRD patterns reveal the FCC symmetry for both theTiandTiNfilms. The grain size of the films was found to increase with the increase in substrate temperature. FESEM micrographs showed a smooth morphology of the film with columnar grain structure.

Suggested Citation

  • Nishat Arshi & Junqing Lu & Bon Heun Koo & Chan Gyu Lee & Faheem Ahmed, 2012. "EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OFTiANDTiNFILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 19(04), pages 1-7.
  • Handle: RePEc:wsi:srlxxx:v:19:y:2012:i:04:n:s0218625x12500370
    DOI: 10.1142/S0218625X12500370
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