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EFFECT OF ROTATING DIRECTION AND INTERVAL ON GIANT MAGNETO-IMPEDANCE OF SPUTTEREDNi80Fe20/CuCOMPOSITE WIRES

Author

Listed:
  • D. L. CHEN

    (Department of Physics, East China Normal University, Shanghai 200062, P. R. China)

  • Z. J. ZHAO

    (Engineering Research Center for Nanophotonics and Advanced Instrument, Ministry of Education, Shanghai 200062, P. R. China;
    Department of Physics, East China Normal University, Shanghai 200062, P. R. China)

  • L. JIANG

    (Department of Physics, East China Normal University, Shanghai 200062, P. R. China)

  • J. Z. RUAN

    (Department of Physics, East China Normal University, Shanghai 200062, P. R. China)

  • X. L. YANG

    (Engineering Research Center for Nanophotonics and Advanced Instrument, Ministry of Education, Shanghai 200062, P. R. China;
    Department of Physics, East China Normal University, Shanghai 200062, P. R. China)

Abstract

In this paper, a new method for fabricatingNi80Fe20/Cucomposite wires is presented. A series of samples were prepared by alternating the rotating direction of theCuwire during RF magnetron sputtering. In order to keep the overall coating thickness of all the samples constant, the alternating intervals and rotating period of each sample during sputtering were varied. As the rotating period increased, the samples showed different magneto-impedance profiles. Experimental results indicated that there was a critical thickness for single sputtered layer which the MI ratio was significantly enhanced at a relatively low driven current frequency. Qualitative discussion on these phenomena was explained in terms of exchange interaction and electromagnetic interactions.

Suggested Citation

  • D. L. Chen & Z. J. Zhao & L. Jiang & J. Z. Ruan & X. L. Yang, 2011. "EFFECT OF ROTATING DIRECTION AND INTERVAL ON GIANT MAGNETO-IMPEDANCE OF SPUTTEREDNi80Fe20/CuCOMPOSITE WIRES," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 18(06), pages 223-227.
  • Handle: RePEc:wsi:srlxxx:v:18:y:2011:i:06:n:s0218625x11014618
    DOI: 10.1142/S0218625X11014618
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