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Preparation Of Gradated Nano-Transient Layer At Interface Between Deposited Film And Substrate By High-Intensity Pulsed Ion Beam Irradiation

Author

Listed:
  • JIACHANG LIANG

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • LIPING ZHANG

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • ZHIPING WANG

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • YIFEI CHEN

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • CHAOHUI JI

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • YANYAN ZHANG

    (College of Science, Civil Aviation University of China, Tianjin 300300, China)

  • PENG ZHANG

    (Engineering and Technology Training Center, Civil Aviation University of China, Tianjin 300300, China)

  • XUEYANG ZHANG

    (Engineering and Technology Training Center, Civil Aviation University of China, Tianjin 300300, China)

  • JIANXING XU

    (College of Aeronautical Engineering, Civil Aviation University of China, Tianjin 300300, China)

  • YUE CHEN

    (College of Aeronautical Engineering, Civil Aviation University of China, Tianjin 300300, China)

  • XUELAN HU

    (College of Aeronautical Engineering, Civil Aviation University of China, Tianjin 300300, China)

  • LIHUI JIANG

    (Tianjin Key Laboratory for Advanced Signal Processing, Civil Aviation University of China, Tianjin 300300, China)

  • XIAOYUN LE

    (School of Physics and Nuclear Energy Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083, China)

  • CUIHUA RONG

    (School of Physics and Nuclear Energy Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083, China)

  • MINGKAI LEI

    (Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)

  • JINGPING XIN

    (Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China)

Abstract

We prepared gradated nano-transient layers at different interfaces between deposited film and substrates by high-intensity pulsed ion beam (HIPIB) irradiation. The deposited film was (Al–Si) alloy and substrates wereNiandTi, respectively. The gradated nano-transient layers at different interfaces were measured by Rutherford backscattering, its spectra were solved by SIMNRA code and then the microstructures of the gradated nano-transient layers at the interfaces of these two irradiated samples were obtained. The experimental results were analyzed by STEIPIB code. The formation of the gradated distribution of element contents in nano-transient layer at the interface can eliminate the abrupt changes of thermal and elastic characteristics at the interface. And, it can greatly reduce the mismatch of thermal expansion coefficients and Young's modulus at the interface between deposited film and substrate. Thus, after the formation of the gradated nano-transient layer, the adhesion at the interface between different materials can be enhanced and the level of thermal stresses can also be reduced in the case of thermal loading.

Suggested Citation

  • Jiachang Liang & Liping Zhang & Zhiping Wang & Yifei Chen & Chaohui Ji & Yanyan Zhang & Peng Zhang & Xueyang Zhang & Jianxing Xu & Yue Chen & Xuelan Hu & Lihui Jiang & Xiaoyun Le & Cuihua Rong & Mingk, 2010. "Preparation Of Gradated Nano-Transient Layer At Interface Between Deposited Film And Substrate By High-Intensity Pulsed Ion Beam Irradiation," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 17(05n06), pages 463-468.
    • Handle: RePEc:wsi:srlxxx:v:17:y:2010:i:05n06:n:s0218625x10014296
    DOI: 10.1142/S0218625X10014296
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