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REACTIVE HOT PRESSING AND OXIDATION BEHAVIOR OFHf-BASED ULTRA-HIGH- TEMPERATURE CERAMICS

Author

Listed:
  • SEUNG JUN LEE

    (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 335 Gwahangno, Yuseong-gu, Daejeon 305-701, Republic of Korea)

  • EUL SON KANG

    (Agency for Defense Development (ADD), 462 Jochiwongil, Yuseong-gu, Daejeon 305-600, Republic of Korea)

  • SEUNG SU BAEK

    (Agency for Defense Development (ADD), 462 Jochiwongil, Yuseong-gu, Daejeon 305-600, Republic of Korea)

  • DO KYUNG KIM

    (Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 335 Gwahangno, Yuseong-gu, Daejeon 305-701, Republic of Korea)

Abstract

AHfB2-SiCceramics were fabricated via a reactive hot pressing usingHf,B4C, andSias precursors. The reaction temperature for the reactive hot pressing between 1800 and 1900°C was determined by reaction of the precursor at different temperatures from 900 to 1800°C. The effective size reduction of precursors was investigated by vibration milling, which exhibited a critical role to achieve high densification and uniform microstructure. Also, it has affected the oxidation behavior ofHfB2–SiCin air. Vibration milled sample showed uniform surface ofSiO2layer, but sample which was fabricated by as-received powder exhibited non-uniform oxidation behavior. Examination of the mechanical properties showed that particle size reduction via vibration also led to improved flexural strength, hardness and fracture toughness.

Suggested Citation

  • Seung Jun Lee & Eul Son Kang & Seung Su Baek & Do Kyung Kim, 2010. "REACTIVE HOT PRESSING AND OXIDATION BEHAVIOR OFHf-BASED ULTRA-HIGH- TEMPERATURE CERAMICS," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 17(02), pages 215-221.
    • Handle: RePEc:wsi:srlxxx:v:17:y:2010:i:02:n:s0218625x10013886
    DOI: 10.1142/S0218625X10013886
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