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ENHANCED LIGHT EXTRACTION FROM COLLOIDALZnOQD FILM BY ADDING ON PHOTONIC CRYSTALS USING UV-NANOIMPRINT LITHOGRAPHY

Author

Listed:
  • XIALI LI

    (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China;
    Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China)

  • GUANGQIAN YANG

    (Institute to Applied Chemistry, Shanghai Normal University, Shanghai 200234, P. R. China)

  • JIAN CHEN

    (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China)

  • RONGJUN ZHANG

    (School of Information Science and Engineering, Fudan University, Shanghai 200433, P. R. China)

  • WEIMIN ZHOU

    (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China)

  • YANBO LIU

    (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China)

  • JING ZHANG

    (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China)

  • QINGKANG WANG

    (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China)

Abstract

A significant enhancement in light extraction from colloidalZnOQD films was observed on an addition of a layer of two-dimensional photonic crystal (2D-PC) structure. The PCs with a rectangular-lattice air-hole array pattern with the period of 1.4 μm and the hole-size of 400 nm were fabricated by UV-nanoimprint lithography (UV-NIL). Unlike the commonly utilized electron-beam lithographic technique, the UV-NIL process can make patterns over a large area with high throughput. The resultant colloidal zinc oxide(ZnO)QD films with a PC pattern add-on had nearly double the output power, as measured from the top of the film.

Suggested Citation

  • Xiali Li & Guangqian Yang & Jian Chen & Rongjun Zhang & Weimin Zhou & Yanbo Liu & Jing Zhang & Qingkang Wang, 2009. "ENHANCED LIGHT EXTRACTION FROM COLLOIDALZnOQD FILM BY ADDING ON PHOTONIC CRYSTALS USING UV-NANOIMPRINT LITHOGRAPHY," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 16(03), pages 367-373.
    • Handle: RePEc:wsi:srlxxx:v:16:y:2009:i:03:n:s0218625x09012731
    DOI: 10.1142/S0218625X09012731
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