Author
Listed:
- PEI ZHAO
(Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China)
- RENG WANG
(Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China)
- DINGQUAN LIU
(Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China)
- FENGSHAN ZHANG
(Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China)
- WEITAO SU
(Institute of Materials Physics, Hangzhou Dianzi University, Hangzhou 310018, China)
- XIAOFENG XU
(Sciences College, Donghua University, Shanghai 200051, China)
Abstract
The effects of the roughness ofZnSunderlayer on the microstructure, optical, and electrical properties of nanometerAgthin film have been investigated in this paper. NanometerAgthin films inglass/ZnS/7.5 nmAg/30 nmZnSstacks have been deposited and analyzed. In the stacks, the underlayers ofZnShave been sputtered with various thicknesses to generate various surface roughnesses. The X-ray diffraction (XRD) has been used to study the crystal structure ofAgfilms. The surface topography and the roughness ofZnSunderlayer have been analyzed by atomic force microscopy. The sheet resistant will become larger as the increasing of the roughness. The optical constants can be derived by fitting the transmission and reflectance spectrum. From optical constants comparison ofAgfilms, with the surface of the stack becoming rougher, it was found that the refractive index will increase but the extinction coefficient will decrease.
Suggested Citation
Pei Zhao & Reng Wang & Dingquan Liu & Fengshan Zhang & Weitao Su & Xiaofeng Xu, 2008.
"UNDERLAYER ROUGHNESS INFLUENCE ON THE PROPERTIES OFAgTHIN FILM,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 15(06), pages 787-791.
Handle:
RePEc:wsi:srlxxx:v:15:y:2008:i:06:n:s0218625x08012062
DOI: 10.1142/S0218625X08012062
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