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MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OFTiNFILMS

Author

Listed:
  • MUBARAK ALI

    (Department of Physics, COMSATS Institute of Information Technology (CIIT), Park Road, Islamabad, Pakistan)

  • ESAH HAMZAH

    (Faculty of Mechanical Engineering, Universiti Teknologi Malaysia, 81310, Skudai, Johor, Malaysia)

  • TAHIR ABBAS

    (Department of Physics, Bahauddin Zakariya University, Multan, 60800, Pakistan)

  • MOHD RADZI HJ. MOHD TOFF

    (Advanced Materials Research Center (AMREC), SIRIM Berhad, Kulim Hi-Tech Park, 09000 Kulim, Kedah, Malaysia)

  • ISHTIAQ A. QAZI

    (National University of Sciences and Technology, Tamiz-ud-din Road, Rawalpindi, Pakistan)

Abstract

Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated inTiNcoatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets.

Suggested Citation

  • Mubarak Ali & Esah Hamzah & Tahir Abbas & Mohd Radzi Hj. Mohd Toff & Ishtiaq A. Qazi, 2008. "MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OFTiNFILMS," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 15(05), pages 653-659.
    • Handle: RePEc:wsi:srlxxx:v:15:y:2008:i:05:n:s0218625x08011810
    DOI: 10.1142/S0218625X08011810
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