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DEPOSITION OFAlNAND OXIDIZEDAlNTHIN-FILMS BY REACTIVE SPUTTERING: CORRELATION BETWEEN FILM GROWTH AND DEPOSITION PARAMETERS

Author

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  • MANUEL GARCÍA-MÉNDEZ

    (Laboratorio de Nanociencias y Nanotecnología, Facultad de Ciencias Físico-Matemáticas de la UANL, División de Posgrado, Manuel L. Barragán S/N, Edif. de Posgrado, Ciudad Universitaria, San Nicolás de los Garza, N.L. 66450, México)

  • SANTOS MORALES-RODRÍGUEZ

    (Programa de Posgrado en Ingeniería Física Industrial, Facultad de Ciencias Físico-Matemáticas de la UANL, División de Posgrado, Manuel L. Barragán S/N, Edif. de Posgrado, Ciudad Universitaria, San Nicolás de los Garza, N.L. 66450, México)

  • LUCIANO ELIÉZER RAMÍREZ

    (Instituto Tecnológico de Saltillo, V. Carranza 2400, Col. Tecnológico, Saltillo, Coahuila, México)

  • EDUARDO G. PÉREZ-TIJERINA

    (Laboratorio de Nanociencias y Nanotecnología, Facultad de Ciencias Físico-Matemáticas de la UANL, División de Posgrado, Manuel L. Barragán S/N, Edif. de Posgrado, Ciudad Universitaria, San Nicolás de los Garza, N.L. 66450, México;
    Centro de Investigación en Materiales Avanzados, (CIMAV), México, Chihuahua, 31109, México)

Abstract

A set ofAlNfilms were deposited by reactive direct current (DC) magnetron sputtering. Films were analyzed with X-ray diffraction and Auger Electron Spectroscopy (AES). There is a correlation between deposition parameters and crystal growth. Depending on the deposition parameters, films can present a hexagonal würzite (P6mm) or cubic zinc-blend (Fm3m) microstructure. Oxygen appears to induce on films a degree of amorphous growth and a distortion of the lattice parameters. For the film with cubic microstructure, AES transitions detected near the surface level at 56 eV and 66 eV were attributed to aluminum-oxide (AlxOy),AlN, and metallicAl.

Suggested Citation

  • Manuel García-Méndez & Santos Morales-Rodríguez & Luciano Eliézer Ramírez & Eduardo G. Pérez-Tijerina, 2008. "DEPOSITION OFAlNAND OXIDIZEDAlNTHIN-FILMS BY REACTIVE SPUTTERING: CORRELATION BETWEEN FILM GROWTH AND DEPOSITION PARAMETERS," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 15(04), pages 453-458.
    • Handle: RePEc:wsi:srlxxx:v:15:y:2008:i:04:n:s0218625x08011585
    DOI: 10.1142/S0218625X08011585
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