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PREPARINGNi–WALLOY FILMS WITH LOW INTERNAL STRESS AND HIGH HARDNESS BY HEAT TREATING

Author

Listed:
  • RUI LIU

    (Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China)

  • HONG WANG

    (Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China)

  • JIN-YUAN YAO

    (Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China)

  • XUE-PING LI

    (Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China)

  • GUI-FU DING

    (Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, National Key Laboratory of Micro/Nano Fabrication Technology, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China)

Abstract

In this paper, the internal stress and hardness ofNi–Walloy films withWcontents in the range of 0–59 wt% were investigated. The amorphousNi–Walloy films were electrodeposited with 59 wt%Wcontent and the structure of crystalline alloy films was formed after heat treating. The experimental results showed that heat treating could prepareNi–Walloy films with lower internal stress compared with lowWcontent alloy films, and the heat treated alloy films still have high hardness. The internal stress and the hardness were about 230 MPa and 1000 Hv, respectively, when the heat treating temperature was 550°C. The relation of internal stress and hardness with the structure of alloy films is discussed.

Suggested Citation

  • Rui Liu & Hong Wang & Jin-Yuan Yao & Xue-Ping Li & Gui-Fu Ding, 2007. "PREPARINGNi–WALLOY FILMS WITH LOW INTERNAL STRESS AND HIGH HARDNESS BY HEAT TREATING," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 14(06), pages 1107-1112.
    • Handle: RePEc:wsi:srlxxx:v:14:y:2007:i:06:n:s0218625x07010676
    DOI: 10.1142/S0218625X07010676
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