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Fabrication Of Silicon Nanoarrays By Direct Nanosphere Lithography

Author

Listed:
  • L. XU

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • W. LI

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • W. M. ZHAO

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • P. SUN

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • J. XU

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • Z. Y. MA

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • X. F. HUANG

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

  • K. J. CHEN

    (Key Laboratory of Advanced Photonic and Electronic Materials and Department of Physics, Nanjing University Nanjing 210093, P. R. China)

Abstract

We present the fabrication of large-scale two-dimensional periodic silicon nanoarrays using nanosphere lithography. The techniques start from a monolayer of self-assembled polystyrene (PS) spheres of 220 nm in diameter on water surface, which works as a mask to fabricate large-scale periodic silicon nanoarrays by direct plasmatherm reactive ion (RIE) etching. AFM images of the nanoarrays show that the patterns of PS templates are well transferred to theSisurface. The tips stand 50–80 nm high and the lateral size is around 150 nm. The optimum fabrication conditions can be chosen via the analysis of the experimental data.

Suggested Citation

  • L. Xu & W. Li & W. M. Zhao & P. Sun & J. Xu & Z. Y. Ma & X. F. Huang & K. J. Chen, 2007. "Fabrication Of Silicon Nanoarrays By Direct Nanosphere Lithography," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 14(04), pages 709-712.
    • Handle: RePEc:wsi:srlxxx:v:14:y:2007:i:04:n:s0218625x07009979
    DOI: 10.1142/S0218625X07009979
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    Keywords

    Silicon nanoarray; nanosphere lithography;

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