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Effects Of Technical Parameters On The Pulsed Laser Deposited Ferroelectric Films

Author

Listed:
  • YAFAN ZHAO

    (School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China;
    Shandong Architecture University, Ji'nan 250014, P. R. China)

  • CHUANZHONG CHEN

    (School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China)

  • MINGDA SONG

    (School of Mechanical Engineering, Shandong University, Ji'nan 250061, P. R. China)

  • JIE MA

    (School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China)

  • DIANGANG WANG

    (School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China)

Abstract

Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of ferroelectric films. Effects of technical parameters on the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, post-annealing, buffer layer, target composition, energy density, wavelength, target-to-substrate distance, and laser pulse rate, are systematically reviewed in order to optimize these parameters. Processing-microstructure-property relationships of ferroelectric films by PLD are discussed. The application prospect is pointed as well.

Suggested Citation

  • Yafan Zhao & Chuanzhong Chen & Mingda Song & Jie Ma & Diangang Wang, 2006. "Effects Of Technical Parameters On The Pulsed Laser Deposited Ferroelectric Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 13(05), pages 687-695.
    • Handle: RePEc:wsi:srlxxx:v:13:y:2006:i:05:n:s0218625x06008669
    DOI: 10.1142/S0218625X06008669
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