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EFFECT OFBiSURFACTANT IN THE HETEROEPITAXIAL GROWTH OFCoONCuSURFACES

Author

Listed:
  • MASAO KAMIKO

    (Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • HIROAKI CHIHAYA

    (Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • WATARU SUGIMOTO

    (Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • RYOICHI YAMAMOTO

    (Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • SANGMUN OH

    (Magnetic Recording System Research Department, Central Research Lab., Hitachi, Ltd., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan)

  • JUNHUA XU

    (Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5,1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan)

  • ISAO KOJIMA

    (Materials Characterization Division, National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 5,1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan)

Abstract

We have investigated the effect ofBion the heteroepitaxial growth ofCoonCuby reflection high-energy electron diffraction (RHEED) measurements. It was found thatBienhanced the layer-by-layer growth ofCoon theCu(111)surfaces at 100°C. The dependence of the growth onBilayer thickness suggested that there existed a suitable amount ofBisurfactant layer that enhanced smoother layered growth. On the contrary, for the case ofCogrowth onCu(100),Bidepressed the layer-by-layer growth ofCoonCu(100). The surface segregation effect ofBiwas also studied by Auger electron spectroscopy (AES).

Suggested Citation

  • Masao Kamiko & Hiroaki Chihaya & Wataru Sugimoto & Ryoichi Yamamoto & Sangmun Oh & Junhua Xu & Isao Kojima, 2006. "EFFECT OFBiSURFACTANT IN THE HETEROEPITAXIAL GROWTH OFCoONCuSURFACES," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 13(02n03), pages 201-207.
    • Handle: RePEc:wsi:srlxxx:v:13:y:2006:i:02n03:n:s0218625x06008153
    DOI: 10.1142/S0218625X06008153
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