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PREPARATION AND MICROSTRUCTURE OF THINTiO2FILMS CONTAININGCaANDPUSING MICRO-ARC OXIDATION

Author

Listed:
  • QING DONG

    (School of Materials Science and Engineering, Shandong University, Shandong, Ji'nan 250061, P. R. China)

  • CHUANZHONG CHEN

    (School of Materials Science and Engineering, Shandong University, Shandong, Ji'nan 250061, P. R. China)

  • DIANGANG WANG

    (School of Materials Science and Engineering, Shandong University, Shandong, Ji'nan 250061, P. R. China)

  • QIANMAO JI

    (Shandong Information Technology College, Shandong, Weifang 261041, P. R. China)

Abstract

Micro-arc oxidation (MAO) is a novel technique for producing oxide films on metals likeAl,Mg,TiandZr. A ceramic-like film containingCaandPwas deposited onTi-6Al-4Vsubstrate by MAO in an electrolytic solution using a pulsed power supply. XRD indicated that the film was a mixture of anatase, rutile and VO. SEM showed that the surface of the film was microporous with 1–2 μm pores. EDS gave the element distributions of the cross-section. The result indicated that elements likeCaandPcould be incorporated into the film during MAO process. The microhardness test showed that the film had an average hardness of 540 HV0.025.

Suggested Citation

  • Qing Dong & Chuanzhong Chen & Diangang Wang & Qianmao Ji, 2005. "PREPARATION AND MICROSTRUCTURE OF THINTiO2FILMS CONTAININGCaANDPUSING MICRO-ARC OXIDATION," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 12(04), pages 555-559.
    • Handle: RePEc:wsi:srlxxx:v:12:y:2005:i:04:n:s0218625x05007426
    DOI: 10.1142/S0218625X05007426
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