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NUCLEATION AND SURFACE MORPHOLOGY OF COBALT FILMS ELECTRODEPOSITED ONPt/SiSUBSTRATES

Author

Listed:
  • A. SAHARI

    (Laboratoire d'Energétique et d'Electrochimie du Solide, Université de Sétif, 19000 Algérie, Algeria)

  • A. AZIZI

    (Laboratoire d'Energétique et d'Electrochimie du Solide, Université de Sétif, 19000 Algérie, Algeria)

  • N. FENINECHE

    (LERMPS, Université de Belfort-Monbéliard, 90010 Belfort, France)

  • G. SCHMERBER

    (Institut de Physique et Chimie des Matériaux de Strasbourg, UMR 7504 du CNRS-ULP-ECPM, 23 rue du Loess, B.P. 43, 67034 Strasbourg Cedex 2, France)

  • A. DINIA

    (Institut de Physique et Chimie des Matériaux de Strasbourg, UMR 7504 du CNRS-ULP-ECPM, 23 rue du Loess, B.P. 43, 67034 Strasbourg Cedex 2, France)

Abstract

Cofilms deposited onPt/Si(100)surface by electrodeposition from mixed sulphate chloride baths are investigated. The influence of applied potentials on nucleation, growth and morphological properties is studied using electrochemistry, scanning electronic microscopy (SEM) and atomic force microscopy (AFM) measurements. The electrochemical techniques show a deposition peak characteristic of diffusion-limited growth. For both applied potentials, we note that deposition occurs by instantaneous nucleation and diffusion-limited growth of 3D nucleation mechanism. Morphology observations reveal the granular structure of the electrodepositedColayers surface with the root-mean-square roughness,Rq, varied between 7.80 and 8.95 nm. The average sizes of theCocrystallites depend strongly on the film thickness and applied potentials.

Suggested Citation

  • A. Sahari & A. Azizi & N. Fenineche & G. Schmerber & A. Dinia, 2005. "NUCLEATION AND SURFACE MORPHOLOGY OF COBALT FILMS ELECTRODEPOSITED ONPt/SiSUBSTRATES," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 12(03), pages 391-396.
    • Handle: RePEc:wsi:srlxxx:v:12:y:2005:i:03:n:s0218625x05007189
    DOI: 10.1142/S0218625X05007189
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