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X-Ray Photoelectron Spectroscopy Studies On The Bonding Properties Of Amorphous Carbon Nitride Films Synthesized By Pulsed Laser Deposition With Different Substrate Temperatures

Author

Listed:
  • M. RUSOP

    (Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan)

  • T. SOGA

    (Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan)

  • T. JIMBO

    (Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Showa-ku, Nagoya 466-8555, Japan)

Abstract

Amorphous carbon nitride films(a-CNx)were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis ofa-CNxfilms was investigated. The nitrogen-to-carbon(N/C)and oxygen-to-carbon(O/C)atomic ratios, bonding state, and microstructure of the depositeda-CNxfilms were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states betweenCandN, andCandOin the deposited films were found to be significantly influenced by ST during the deposition process. TheN/CandO/Catomic ratios of thea-CNxfilms reached the maximum value at 400°C. ST of 400°C was proposed to promote the desiredsp3-hybridizedCand theC3N4phase. TheC–Nbonding ofC–N,C=NandC≡Nwere observed in the films.

Suggested Citation

  • M. Rusop & T. Soga & T. Jimbo, 2005. "X-Ray Photoelectron Spectroscopy Studies On The Bonding Properties Of Amorphous Carbon Nitride Films Synthesized By Pulsed Laser Deposition With Different Substrate Temperatures," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 12(02), pages 185-195.
    • Handle: RePEc:wsi:srlxxx:v:12:y:2005:i:02:n:s0218625x05006949
    DOI: 10.1142/S0218625X05006949
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