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Structure of Nanoparticles of Aluminum and Silicon Nitrides Produced by RF Plasma

Author

Listed:
  • Takeshi Sato

    (Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-8577, Japan)

  • Chihiro Kaito

    (Department of Nanophysics in Frontier Project, Ritsumeikan University, Shiga 525-8577, Japan)

  • Yoshio Saito

    (Department of Electron and Information Science, Kyoto Institute of Technology, Kyoto 606-8585, Japan)

Abstract

AlN and Si3N4particles with sizes of the order of 50 nm were produced by passing Al and Si smoke particles of the order of 50 nm in size through a plasma field. The resulting particles showed the characteristic crystal structure of a nitride. When Al and Si particles were produced in a mixture gas of N2and Ar without plasma, the particles produced were covered with an amorphous nitride layer composed of microcrystallites. Since the flow rate of metallic particles in the plasma region is of the order of 1 m/s, the present particles changed into nitride particles instantaneously.

Suggested Citation

  • Takeshi Sato & Chihiro Kaito & Yoshio Saito, 2003. "Structure of Nanoparticles of Aluminum and Silicon Nitrides Produced by RF Plasma," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 10(02n03), pages 435-442.
    • Handle: RePEc:wsi:srlxxx:v:10:y:2003:i:02n03:n:s0218625x03005293
    DOI: 10.1142/S0218625X03005293
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    Keywords

    AlN particle; Si3N4particle; electron microscopy;
    All these keywords.

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