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Measurement Of Critical Exponents Of Platinum Thin Films

Author

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  • M. C. SALVADORI

    (Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil)

  • L. L. MELO

    (Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil)

  • M. CATTANI

    (Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil)

  • O. R. MONTEIRO

    (Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA)

  • I. G. BROWN

    (Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA)

Abstract

We have fabricated platinum thin films by metal plasma ion deposition on silicon substrates. The roughness of these films has been measured by a scanning tunneling microscope (STM) and we have determined the growth dynamics critical exponents.

Suggested Citation

  • M. C. Salvadori & L. L. Melo & M. Cattani & O. R. Monteiro & I. G. Brown, 2003. "Measurement Of Critical Exponents Of Platinum Thin Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 10(01), pages 1-5.
    • Handle: RePEc:wsi:srlxxx:v:10:y:2003:i:01:n:s0218625x03004561
    DOI: 10.1142/S0218625X03004561
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    Cited by:

    1. L. L. Melo & M. C. Salvadori & M. Cattani, 2003. "Measurement Of Critical Exponents Of Nanostructured Gold Thin Films," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 10(06), pages 903-908.

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    Keywords

    Platinum thin films; critical exponents;

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