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A Soft X-Ray Undulator Beamline At The Advanced Light Source With Circular And Variable Linear Polarization For The Spectroscopy And Microscopy Of Magnetic Materials

Author

Listed:
  • ANTHONY T. YOUNG

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • ELKE ARENHOLZ

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • JUN FENG

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • HOWARD PADMORE

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • STEVE MARKS

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • ROSS SCHLUETER

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • EGON HOYER

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • NICHOLAS KELEZ

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

  • CHRISTOPH STEIER

    (Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA)

Abstract

A new undulator beamline at the Advanced Light Source, Lawrence Berkeley National Laboratory is described. This new beamline has an Apple II type undulator which produces linearly and elliptically polarized X-rays. A high resolution monochromator directs the radiation to two branchlines. The first branchline is optimized for spectroscopy and accommodates multiple endstations simultaneously. The second branchline features a photoemission electron microscope. A novel feature of the beamline is the ability to produce linearly polarized radiation at arbitrary, user-selectable angles. Applications of the new beamline are also described.

Suggested Citation

  • Anthony T. Young & Elke Arenholz & Jun Feng & Howard Padmore & Steve Marks & Ross Schlueter & Egon Hoyer & Nicholas Kelez & Christoph Steier, 2002. "A Soft X-Ray Undulator Beamline At The Advanced Light Source With Circular And Variable Linear Polarization For The Spectroscopy And Microscopy Of Magnetic Materials," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 9(01), pages 549-554.
    • Handle: RePEc:wsi:srlxxx:v:09:y:2002:i:01:n:s0218625x02002622
    DOI: 10.1142/S0218625X02002622
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