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OXIDE LAYER FORMED ON THE SURFACE OF OZONE-TREATED InP

Author

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  • GAMAL ABDEL FATTAH

    (National Institute of Laser Enhanced Sciences, Cairo University, Giza, Egypt)

Abstract

Oxides are formed on InP substrates under UV/ozone illumination. The thickness of the formed oxides increases as the exposure time to the UV source increases, and tends to saturate after three hours of exposure. The optical transmission and X-ray diffraction measurements predict the formation of the oxide layer. X-ray diffraction shows that the oxide film is a mixture ofIn2O3andInPO4and seems to beIn2O3-rich. The integrated absorption coefficient of the formed oxide layer does not depend on the wavelengths in the range of 800–1400 nm, and is found to be in the order of107cm-1. The reflections from the sample surface after UV/ozone oxidation at different exposure times are also measured.

Suggested Citation

  • Gamal Abdel Fattah, 2001. "OXIDE LAYER FORMED ON THE SURFACE OF OZONE-TREATED InP," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 8(01n02), pages 7-9.
    • Handle: RePEc:wsi:srlxxx:v:08:y:2001:i:01n02:n:s0218625x01000872
    DOI: 10.1142/S0218625X01000872
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