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A New Low Energy Electron Microscope

Author

Listed:
  • R. M. Tromp

    (IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA)

  • M. Mankos

    (IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA;
    ETEC Systems, Inc., 26460 Corporate Avenue, Hayward, CA 94545, USA)

  • M. C. Reuter

    (IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA)

  • A. W. Ellis

    (IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA)

  • M. Copel

    (IBM Research Division, T. J. Watson Research Center, PO Box 218, Yorktown Heights, NY 10598, USA)

Abstract

Low energy electron microscopy (LEEM) has developed into one of the premier techniques forin situstudies of surface dynamical processes, such as epitaxial growth, phase transitions, chemisorption and strain relaxation phenomena. Over the last three years we have designed and constructed a new LEEM instrument, aimed at improved resolution, improved diffraction capabilities and greater ease of operation compared to present instruments.

Suggested Citation

  • R. M. Tromp & M. Mankos & M. C. Reuter & A. W. Ellis & M. Copel, 1998. "A New Low Energy Electron Microscope," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 5(06), pages 1189-1197.
    • Handle: RePEc:wsi:srlxxx:v:05:y:1998:i:06:n:s0218625x98001523
    DOI: 10.1142/S0218625X98001523
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