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Morphology of Silver Thin Films Deposited onTiO2(110)Surfaces

Author

Listed:
  • D. Abriou

    (Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France)

  • D. Gagnot

    (Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France)

  • J. Jupille

    (Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France)

  • F. Creuzet

    (Laboratoire CNRS, Saint-Gobain "Surface du Verre et Interfaces," BP 135, F-93303 Aubervilliers, France)

Abstract

The growth mode of silver films deposited at room temperature onTiO2(110)surfaces has been examined by means of atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions, On clean vacancy-freeTiO2(110)surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved, furthermore, the influence of surface oxygen vacancies on the growth ofAg/TiO2(110)is evidenced by well-characterized differences in the morphology of 9-nm-thick silver deposits.

Suggested Citation

  • D. Abriou & D. Gagnot & J. Jupille & F. Creuzet, 1998. "Morphology of Silver Thin Films Deposited onTiO2(110)Surfaces," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 5(01), pages 387-392.
    • Handle: RePEc:wsi:srlxxx:v:05:y:1998:i:01:n:s0218625x98000712
    DOI: 10.1142/S0218625X98000712
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