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ELECTRON DIFFRACTION AND PHOTOEMISSION STUDIES OF CLEAN AND WATER-COVEREDSi(5,5,12)ANDSi(112)SURFACES

Author

Listed:
  • W. RANKE

    (Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin (Dahlem), Germany)

  • Y. R. XING

    (State Key Laboratory for Surface Physics, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083, China)

Abstract

The structure of silicon surfaces in the orientation range (113)–(5,5,12)–(337)–(112) has been investigated using high resolution LEED and photoemission both on a spherical and on flat samples. We find that Si(5,5,12) [5.3° from (113) and 0.7° from (337)] is the only stable orientation between (113) and (111) and confirm the result of Baskiet al.[Science269, 1556 (1995)] that it has a2 × 1superstructure with a very large unit cell of7.68 × 53.5 Å2. Adsorption measurements of water on Si(5,5,12) yield a mobile precursor kinetics with two kinds of regions saturating at 0.25 and 0.15 ML which are related to adsorption on different sites. Using these results, a modified structure model is proposed. Surfaces between (113) and (5,5,12) separate into facets of these two orientations; between (5,5,12) and (112), they separate into (5,5,12) and (111) facets. (337) facets in this range may be considered as defective (5,5,12) facets.

Suggested Citation

  • W. Ranke & Y. R. Xing, 1997. "ELECTRON DIFFRACTION AND PHOTOEMISSION STUDIES OF CLEAN AND WATER-COVEREDSi(5,5,12)ANDSi(112)SURFACES," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 4(01), pages 15-23.
    • Handle: RePEc:wsi:srlxxx:v:04:y:1997:i:01:n:s0218625x97000043
    DOI: 10.1142/S0218625X97000043
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