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ELECTRON TRANSPORT PROPERTIES IN FINE-PARTICLE FILMS OF Au EVAPORATED ONTO Si NATIVE OXIDE: THERMAL ANNEALING EFFECTS

Author

Listed:
  • H. KASAHARA

    (Center for Instrumental Analysis, Kobe University, Rokko, Nada, Kobe 657, Japan)

  • T. SHIKATA

    (Department of Electric & Electronics Engineering, Kobe University, Rokko, Nada, Kobe 657, Japan)

  • K. YAMAMOTO

    (Department of Electric & Electronics Engineering, Kobe University, Rokko, Nada, Kobe 657, Japan)

Abstract

We investigated electron transport in fine-particle films of Au prepared onto Si native oxide. Electron transport measurements and TEM observations were carried out for as-deposited and after thermal treatment of the films in air. We observed the anomalous resistance increases in as-deposited fine-particle films of Au and obtainedαT=4.5. After 150°C thermal treatment in air, however, these anomalous resistance increases in the Au films disappeared and its topography appeared on the TEM images drastically changed into percolative structure. We found that the size of the Au fine particles causes anomalous resistance increase at low temperature.

Suggested Citation

  • H. Kasahara & T. Shikata & K. Yamamoto, 1996. "ELECTRON TRANSPORT PROPERTIES IN FINE-PARTICLE FILMS OF Au EVAPORATED ONTO Si NATIVE OXIDE: THERMAL ANNEALING EFFECTS," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 3(01), pages 1133-1136.
    • Handle: RePEc:wsi:srlxxx:v:03:y:1996:i:01:n:s0218625x96002023
    DOI: 10.1142/S0218625X96002023
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