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Reactive Accelerated Cluster Erosion (Race)

Author

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  • JÜRGEN GSPANN

    (Universität Karlsruhe und Kernforschungszentrum Karlsruhe Institut für Mikrostrukturtechnik, Postfach 3640, D-76021 Karlsruhe, Germany)

Abstract

Beams of ionized clusters of some thousand atoms are accelerated to about 100-keV kinetic energy to be used for area selective surface erosion. Mask projective cluster-impact lithography allows surface structuring in the submicron regime. Chemical reactions between the cluster and the target material may provide volatile reaction products facilitating ejecta removal. The reactive accelerated cluster erosion (RACE) process is applied to metals like copper and gold, to semiconductors such as silicon, and to insulators like glass, quartz, or sapphire, giving very smooth eroded surface and steep sidewalls.

Suggested Citation

  • Jürgen Gspann, 1996. "Reactive Accelerated Cluster Erosion (Race)," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 3(01), pages 897-900.
    • Handle: RePEc:wsi:srlxxx:v:03:y:1996:i:01:n:s0218625x96001613
    DOI: 10.1142/S0218625X96001613
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