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Energetic Cluster Impact (Eci): A New Method For Thin-Film Formation

Author

Listed:
  • HELLMUT HABERLAND

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

  • MICHAEL MOSELER

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

  • YOU QIANG

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

  • OLIVER RATTUNDE

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

  • THOMAS REINERS

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

  • YONCA THURNER

    (Freiburger Materialforschungszentrum, Stefan Meierstrasse 21, 79104 Freiburg, Germany)

Abstract

A completely ionized beam of metal clusters is deposited with variable kinetic energy on a substrate. Mirror-like and strongly adhering films having unusual properties are produced for sufficiently high cluster impact energies. Numerical simulations provide the physical insight why this novel technique gives different, and sometimes superior results compared to conventional methods. Several examples are presented.

Suggested Citation

  • Hellmut Haberland & Michael Moseler & You Qiang & Oliver Rattunde & Thomas Reiners & Yonca Thurner, 1996. "Energetic Cluster Impact (Eci): A New Method For Thin-Film Formation," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 3(01), pages 887-890.
    • Handle: RePEc:wsi:srlxxx:v:03:y:1996:i:01:n:s0218625x96001595
    DOI: 10.1142/S0218625X96001595
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