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STRUCTURAL AND MAGNETIC PROPERTIES OF EPITAXIALNi80Fe20THIN FILMS ONCu/Si

Author

Listed:
  • I. HASHIM

    (Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA)

  • H.S. JOO

    (Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA)

  • H.A. ATWATER

    (Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA)

Abstract

Single-crystal films of permalloy(Ni80Fe20)were grown onCu(001)seed layers oriented epitaxially withSi(001). The microstructural properties were measured usingin-situreflection high-energy electron diffraction, andex-situtransmission electron microscopy, x-ray diffraction, and atomic force microscopy, whereas the magnetic properties were probed usingin-situmagneto-optic Kerr effect andex-situvibrating sample magnetometry. Anisotropic magnetoresistance and resistivity for some of the samples were also measured. The coercivity for thinner (≤5 nm)Ni80Fe20was significantly higher (10–20 Oersteds) than polycrystalline films deposited onSiO2/Si, and was also higher than films deposited on lattice-matchedCuxNi1–xalloys. These magnetic properties were explained using a theoretical model involving interaction of domain walls with defects such as misfit dislocations and coherent islands, due to the mismatch betweenNi80Fe20andCu.

Suggested Citation

  • I. Hashim & H.S. Joo & H.A. Atwater, 1995. "STRUCTURAL AND MAGNETIC PROPERTIES OF EPITAXIALNi80Fe20THIN FILMS ONCu/Si," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 2(04), pages 427-437.
    • Handle: RePEc:wsi:srlxxx:v:02:y:1995:i:04:n:s0218625x95000388
    DOI: 10.1142/S0218625X95000388
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