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Xps Studies Of The Stability Of A Mixed Zirconium Oxide And Sulphide Thin Film

Author

Listed:
  • P.C. WONG

    (Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada)

  • Y.S. LI

    (Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada)

  • M.Y. ZHOU

    (Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada)

  • K.A.R. MITCHELL

    (Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada)

Abstract

A 25 Å film formed by depositing zirconium(~2 Åmin–1)onto gold foil in the presence ofH2S(~5×10−8mbar)andH2O(~1×10−9mbar)has been studied by XPS. This film has an outer region composed of a mixed zirconium oxide/sulphide, while below there is metallic zirconium plusZr/Aualloy in contact with gold. This film appears stable on heating to 400°C under UHV insofar as the sulphide part does not change, although the oxide part increases apparently as a result of some reaction of metallic zirconium with ambient water. By contrast, when this preheated film at room temperature was treated with a hydrogen plasma, the sulphide component was completely removed and the whole film was converted to theZrO2-like form with enhanced formation of OH groups. The hydrogen plasma treatment is therefore capable of desulphurizing the mixed zirconium oxide/sulphide film.

Suggested Citation

  • P.C. Wong & Y.S. Li & M.Y. Zhou & K.A.R. Mitchell, 1995. "Xps Studies Of The Stability Of A Mixed Zirconium Oxide And Sulphide Thin Film," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 2(02), pages 165-169.
    • Handle: RePEc:wsi:srlxxx:v:02:y:1995:i:02:n:s0218625x95000170
    DOI: 10.1142/S0218625X95000170
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