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THE Cl/Si(100) INTERFACE OBSERVED BY ESDIAD AND RELATED TECHNIQUES

Author

Listed:
  • Q. GUO

    (IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK)

  • D. STERRATT

    (IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK)

  • E.M. WILLIAMS

    (IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK)

Abstract

The adsorption of chlorine on Si(100) surface has been studied using ESDIAD in conjunction with AES and gas uptake techniques. This work presents an extension of earlier studies of the adsorption of halogen gases at Si(100) which served to initiate our development of ESDIAD technique at the IRC. In the present instance, we report the findings in experiments with high-purity chlorine gas from a bottle, which is distinct from our earlier approach with an electrochemical cell for chlorine gas generation. Two types of adsorbate configurations which transform irreversibly are investigated.

Suggested Citation

  • Q. Guo & D. Sterratt & E.M. Williams, 1994. "THE Cl/Si(100) INTERFACE OBSERVED BY ESDIAD AND RELATED TECHNIQUES," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 1(04), pages 539-543.
    • Handle: RePEc:wsi:srlxxx:v:01:y:1994:i:04:n:s0218625x94000618
    DOI: 10.1142/S0218625X94000618
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