IDEAS home Printed from https://ideas.repec.org/a/wsi/srlxxx/v01y1994i02n03ns0218625x94000345.html
   My bibliography  Save this article

The Si(111)$\sqrt 3 \times \sqrt 3 $SURFACES FORMED BY THE ADSORPTION OF GROUP-III, IV, AND V METALS

Author

Listed:
  • S. KONO

    (Research Institute for Scientific Measurements, Tohoku University, Sendai 980-77, Japan)

Abstract

A compilation of experimental studies is made on the properties of the Si(111)$\sqrt 3 \times \sqrt 3 $surfaces formed by the adsorption of metals of groups-III, IV, and V in the periodic table. The metals treated are Al, Ga, In (group-III), Sn, Pb (group-IV), Sb and Bi (group-V). Experimental studies using scanning tunneling microscopy are included only when they are necessary, since the topics will be covered in the review by J. Nogami in this issue. Theoretical aspects of the studies will be covered in the review by H. Nagayoshi in this issue.The geometric and electronic properties of these Si(111)$\sqrt 3 \times \sqrt 3 $surfaces appeared to be the simplest kinds of surfaces on the Si(111), thus providing prototypic examples of reconstruction on the metal/Si submonolayer interfaces. The simplicity in these surfaces is that there are metal-adatoms over essentially truncated Si(111)1×1substrates. The types of "metal building-blocks" are basically two: (i) a single metal adatom on a threefold hollow site (so-calledT4site), (ii) a metal trimer, each of constituent atoms, resides nearly on the ontop site (so-called "milk-stool"). There is large relaxation in the substrate Si due to the presence of metal adatoms.

Suggested Citation

  • S. Kono, 1994. "The Si(111)$\sqrt 3 \times \sqrt 3 $SURFACES FORMED BY THE ADSORPTION OF GROUP-III, IV, AND V METALS," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 1(02n03), pages 359-368.
  • Handle: RePEc:wsi:srlxxx:v:01:y:1994:i:02n03:n:s0218625x94000345
    DOI: 10.1142/S0218625X94000345
    as

    Download full text from publisher

    File URL: http://www.worldscientific.com/doi/abs/10.1142/S0218625X94000345
    Download Restriction: Access to full text is restricted to subscribers

    File URL: https://libkey.io/10.1142/S0218625X94000345?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    More about this item

    Statistics

    Access and download statistics

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:wsi:srlxxx:v:01:y:1994:i:02n03:n:s0218625x94000345. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Tai Tone Lim (email available below). General contact details of provider: http://www.worldscinet.com/srl/srl.shtml .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.