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Laser-vacuum deposited ITO thin films for optoelectronic applications

Author

Listed:
  • Andrei Toikka

    (Lab for Photophysics of media with nanoobjects, Vavilov State Optical Institute, 199053 St. Petersburg, Russia)

  • Natalia Vladimirovna Kamanina

    (Lab for Photophysics of media with nanoobjects, Vavilov State Optical Institute, 199053 St. Petersburg, Russia)

Abstract

In the current paper, it has been considered the relief features and electric properties of the transparent contacts based on the indium tin oxides. During the formation of samples, the laser oriented deposition method using the CO2 laser operated at the wavelength of 10.6 um and with the power of 30 W has been used. The deposition process has been revealed via varied the intensity of external electric field in the range of 100-600 V/cm. The influence of the electric field on the deposition process and its correlation with the relief features and electric properties have been evaluated.

Suggested Citation

  • Andrei Toikka & Natalia Vladimirovna Kamanina, 2021. "Laser-vacuum deposited ITO thin films for optoelectronic applications," Technium, Technium Science, vol. 3(7), pages 154-160, September.
    • Handle: RePEc:tec:techni:ojs:4594
    DOI: 10.47577/technium.v3i7.4594
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