IDEAS home Printed from https://ideas.repec.org/a/taf/uiiexx/v51y2019i2p209-217.html
   My bibliography  Save this article

Generation of patterned indentations for additive manufacturing technologies

Author

Listed:
  • Ulas Yaman
  • Melik Dolen
  • Christoph Hoffmann

Abstract

This article proposes a novel approach to generate patterned indentations for different additive manufacturing methodologies. Surface textures have many practical applications in various fields, but require special manufacturing considerations. In addition to conventional manufacturing processes, additive processes have also been utilized in the last decade to obtain textured surfaces. The current design and fabrication pipeline of additive manufacturing operations have many disadvantages in that respect. For instance, the size of the design (CAD) files grows considerably when there are detailed indentations on the surfaces of the artifacts. The presented method, which employs morphological operations on a sequence of binary images representing the cross-sections of the printed artefact, overcomes such problems while fabricating the textured objects. Furthermore, the presented technique could be conveniently implemented using the existing hardware resources of almost any three-dimensional printer.

Suggested Citation

  • Ulas Yaman & Melik Dolen & Christoph Hoffmann, 2019. "Generation of patterned indentations for additive manufacturing technologies," IISE Transactions, Taylor & Francis Journals, vol. 51(2), pages 209-217, February.
  • Handle: RePEc:taf:uiiexx:v:51:y:2019:i:2:p:209-217
    DOI: 10.1080/24725854.2018.1491076
    as

    Download full text from publisher

    File URL: http://hdl.handle.net/10.1080/24725854.2018.1491076
    Download Restriction: Access to full text is restricted to subscribers.

    File URL: https://libkey.io/10.1080/24725854.2018.1491076?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    More about this item

    Statistics

    Access and download statistics

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:taf:uiiexx:v:51:y:2019:i:2:p:209-217. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Chris Longhurst (email available below). General contact details of provider: http://www.tandfonline.com/uiie .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.