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A study of uniformity pattern for extended designs

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  • Tingxun Gou
  • Hong Qin
  • Kashinath Chatterjee

Abstract

The objective of this paper is to investigate the issue of projection discrepancy for extended U-type or nearly U-type extended designs along the line of Fang and Qin (2005) based on the centered L2-discrepancy proposed in Hickernell (1998). Extended designs are obtained through augmenting optimally few runs (or points) to an optimal U-type design. Lower bounds to projection discrepancy with reference to the centered L2-discrepancy of extended designs have been obtained. Some illustrative examples are also provided.

Suggested Citation

  • Tingxun Gou & Hong Qin & Kashinath Chatterjee, 2018. "A study of uniformity pattern for extended designs," Communications in Statistics - Theory and Methods, Taylor & Francis Journals, vol. 47(12), pages 2869-2880, June.
    • Handle: RePEc:taf:lstaxx:v:47:y:2018:i:12:p:2869-2880
    DOI: 10.1080/03610926.2017.1343843
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